Keyphrases
Aminosilane
100%
Silicon Nitride
100%
Silicon-germanium
100%
Growth Rate
83%
SiGe Channel
66%
Si Channel
33%
Field-effect Transistors
33%
Critical Dimension Uniformity
16%
Quality Test
16%
SiGe Thin Film
16%
Research Quality
16%
Si Wafer
16%
CVD Precursors
16%
SiGe
16%
Wafer
16%
P-channel
16%
Wafer Fabrication
16%
Device Performance
16%
Electron Holes
16%
Hole Mobility
16%
Material Science
Germanium
100%
Silicon
100%
Silicon Nitride
100%
Field Effect Transistor
33%
Chemical Vapor Deposition
16%
Hole Mobility
16%
Thin Films
16%
Engineering
Nitride
100%
Field-Effect Transistor
50%
Device Performance
25%
Chemical Vapor Deposition
25%
Si Wafer
25%
Desired Material
25%
Thin Films
25%
Critical Dimension
25%
Optimal Condition
25%