TY - GEN
T1 - A discrete event simulation model simplification technique
AU - Johnson, Rachel T.
AU - Fowler, John
AU - Mackulak, Gerald T.
PY - 2005/12/1
Y1 - 2005/12/1
N2 - Cycle Time - Throughput curves (CT-TH), which plot the average cycle time versus start rate for a given product mix, are often used to support decisions made in manufacturing settings, such as the impact of proposed changes in start rate on mean cycle time. Discrete event simulation is often used to generate estimations of cycle time at a significant number of traffic intensities (start rates). However, simulation often requires long run lengths and extensive output analysis. In most manufacturing environments, the time and/or budget available for such simulations is limited. As demands for faster and more accurate results are required, alternative approaches to improving simulation efficiency must be investigated. This research seeks to develop a procedure for simplifying a detailed model into a fast (abstract) simulation model that achieves a statistically indistinguishable level of accuracy and precision. This technique has particular application in the simulation of semiconductor manufacturing facilities.
AB - Cycle Time - Throughput curves (CT-TH), which plot the average cycle time versus start rate for a given product mix, are often used to support decisions made in manufacturing settings, such as the impact of proposed changes in start rate on mean cycle time. Discrete event simulation is often used to generate estimations of cycle time at a significant number of traffic intensities (start rates). However, simulation often requires long run lengths and extensive output analysis. In most manufacturing environments, the time and/or budget available for such simulations is limited. As demands for faster and more accurate results are required, alternative approaches to improving simulation efficiency must be investigated. This research seeks to develop a procedure for simplifying a detailed model into a fast (abstract) simulation model that achieves a statistically indistinguishable level of accuracy and precision. This technique has particular application in the simulation of semiconductor manufacturing facilities.
UR - http://www.scopus.com/inward/record.url?scp=33846678773&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33846678773&partnerID=8YFLogxK
U2 - 10.1109/WSC.2005.1574503
DO - 10.1109/WSC.2005.1574503
M3 - Conference contribution
SN - 0780395204
SN - 9780780395206
T3 - Proceedings - Winter Simulation Conference
SP - 2172
EP - 2176
BT - Proceedings of the 2005 Winter Simulation Conference
T2 - 2005 Winter Simulation Conference
Y2 - 4 December 2005 through 7 December 2005
ER -