Abstract
The reverse polarity change from a polar to a nonpolar state has been successfully incorporated in the design of chemical amplification resists. The imaging mechanism is based on the pinacol-pinacolone rearrangement wherein vic-diols (pinacols) are converted to ketones or aldehydes with photochemically generated acid as a catalyst. In addition to a polymeric pinacol which undergoes the rearrangement very cleanly in the solid state, aqueous base developable three-component negative deep UV resist systems are described, which are based on phenolic resins, small pinacols, and triphenylsulfonium hexafluoroantimonate as the acid generator.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 419-428 |
| Number of pages | 10 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 1466 |
| State | Published - 1991 |
| Event | Proceedings of the Eighth Conference on Advances in Resist Technology and Processing VIII - San Jose, CA, USA Duration: Mar 4 1991 → Mar 5 1991 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering