Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone

M. Zhao; R. Balachandran; P. R. Madigappu; P. Yam; C. Zanelli; R. Sierra; M. Keswani

doi:https://doi.org/10.4028/www.scientific.net/SSP.219.165

Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone

M. Zhao, R. Balachandran, P. R. Madigappu, P. Yam, C. Zanelli, R. Sierra, M. Keswani

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	Ultra Clean Processing of Semiconductor Surfaces XII
Editors	Paul W. Mertens, Marc Meuris, Marc Heyns
Publisher	Trans Tech Publications Ltd
Pages	165-169
Number of pages	5
ISBN (Electronic)	9783038352426
DOIs	https://doi.org/10.4028/www.scientific.net/SSP.219.165
State	Published - 2015
Event	12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014 - Brussels, Belgium Duration: Sep 21 2014 → Sep 24 2014

Publication series

Name	Solid State Phenomena
Volume	219

Other

Other	12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014
Country/Territory	Belgium
City	Brussels
Period	9/21/14 → 9/24/14

Keywords

Cavitation
Feature damage
Hydrophone
Megasonic
Ultrasonic
Wafer cleaning

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Materials Science(all)
Condensed Matter Physics

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https://doi.org/10.4028/www.scientific.net/SSP.219.165

Cite this

Zhao, M., Balachandran, R., Madigappu, P. R., Yam, P., Zanelli, C., Sierra, R., & Keswani, M. (2015). Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone. In P. W. Mertens, M. Meuris, & M. Heyns (Eds.), Ultra Clean Processing of Semiconductor Surfaces XII (pp. 165-169). (Solid State Phenomena; Vol. 219). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.219.165

Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone. / Zhao, M.; Balachandran, R.; Madigappu, P. R. et al.
Ultra Clean Processing of Semiconductor Surfaces XII. ed. / Paul W. Mertens; Marc Meuris; Marc Heyns. Trans Tech Publications Ltd, 2015. p. 165-169 (Solid State Phenomena; Vol. 219).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Zhao, M, Balachandran, R, Madigappu, PR, Yam, P, Zanelli, C, Sierra, R & Keswani, M 2015, Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone. in PW Mertens, M Meuris & M Heyns (eds), Ultra Clean Processing of Semiconductor Surfaces XII. Solid State Phenomena, vol. 219, Trans Tech Publications Ltd, pp. 165-169, 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014, Brussels, Belgium, 9/21/14. https://doi.org/10.4028/www.scientific.net/SSP.219.165

Zhao M, Balachandran R, Madigappu PR, Yam P, Zanelli C, Sierra R et al. Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone. In Mertens PW, Meuris M, Heyns M, editors, Ultra Clean Processing of Semiconductor Surfaces XII. Trans Tech Publications Ltd. 2015. p. 165-169. (Solid State Phenomena). doi: https://doi.org/10.4028/www.scientific.net/SSP.219.165

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title = "Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone",

keywords = "Cavitation, Feature damage, Hydrophone, Megasonic, Ultrasonic, Wafer cleaning",

author = "M. Zhao and R. Balachandran and Madigappu, {P. R.} and P. Yam and C. Zanelli and R. Sierra and M. Keswani",

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Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone

Publication series

Other

Keywords

ASJC Scopus subject areas

Access to Document

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