Abstract
The effect of the control parameters during the deposition of nickel thin films from Ni(acac)2 has been systematically investigated and films have been characterized using AFM, EDX, XRD and conductivity measurements. Screening of the precursor temperature and the flow rate of the carrier gas reveals a narrow range where conductive metallic films can be deposited. The investigation of the time-dependent deposition shows a slow heterogeneous nucleation of nickel on glass, and the effect of various parameters on the observed incubation time has been investigated. The most significant influence was observed when the carrier gas was used in a pulsed manner, which allows a significant reduction of the incubation time and increases the deposition rate.
| Original language | English (US) |
|---|---|
| Title of host publication | Proceedings - Electrochemical Society |
| Editors | A. Devi, R. Fischer, H. Parala, M.D. Allendorf, M. Hitchman |
| Pages | 659-666 |
| Number of pages | 8 |
| Volume | PV 2005-09 |
| State | Published - 2005 |
| Externally published | Yes |
| Event | 15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany Duration: Sep 5 2005 → Sep 9 2005 |
Other
| Other | 15th European Conference on Chemical Vapor Deposition, EUROCVD-15 |
|---|---|
| Country/Territory | Germany |
| City | Bochum |
| Period | 9/5/05 → 9/9/05 |
ASJC Scopus subject areas
- General Engineering