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Delta-doped AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors with high breakdown voltages
Z. Y. Fan
, J. Li
, J. Y. Lin
, H. X. Jiang
Research output
:
Contribution to journal
›
Article
›
peer-review
14
Scopus citations
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Dive into the research topics of 'Delta-doped AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors with high breakdown voltages'. Together they form a unique fingerprint.
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Engineering
Breakdown Voltage
100%
Heterojunctions
100%
Field-Effect Transistor
100%
Metal Oxide Semiconductor
100%
Control Gate
33%
Carrier Mobility
33%
Sapphire Substrate
33%
Current Drain
33%
Material Science
Heterojunction
100%
Metal Oxide
100%
Field Effect Transistor
100%
Oxide Semiconductor
100%
Carrier Concentration
33%
Carrier Mobility
33%
Sapphire
33%
Keyphrases
AlGaN-GaN
100%
High Electron Density
33%
Pinch-off
33%
Insulated Gate
33%
Fabrication Characteristics
33%
Current Driving
33%
DC Characteristics
33%
High Drain Current
33%