Abstract
We introduce a method of geometric screen modification to remove ghost reflections commonly observed in deflectometry optical testing. The proposed method modifies the optical layout and illumination source area to bypass the generation of reflected rays from the undesired surface. The layout flexibility of deflectometry allows us to design specific system layouts that avoid the generation of interrupting secondary rays. The proposed method is supported by optical raytrace simulations, and experimental results are demonstrated with convex and concave lens case studies. Finally, the limitations of the digital masking method are discussed.
Original language | English (US) |
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Pages (from-to) | 1642-1645 |
Number of pages | 4 |
Journal | Optics letters |
Volume | 48 |
Issue number | 7 |
DOIs | |
State | Published - Apr 1 2023 |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics