Erratum: Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

M. C. Zeman; C. C. Fulton; G. Lucovsky; R. J. Nemanich; W. C. Yang

doi:10.1063/1.2201707

Erratum: Publisher's Note: Thermal stability of TiO ₂, ZrO ₂, or HfO ₂ on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

M. C. Zeman, C. C. Fulton, G. Lucovsky, R. J. Nemanich, W. C. Yang

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English (US)
Article number	109902
Journal	Journal of Applied Physics
Volume	99
Issue number	10
DOIs	https://doi.org/10.1063/1.2201707
State	Published - May 15 2006
Externally published	Yes

ASJC Scopus subject areas

General Physics and Astronomy

Access to Document

10.1063/1.2201707

Cite this

@article{bf271244307c44e38600681add9fb2a4,

title = "Erratum: Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))",

author = "Zeman, {M. C.} and Fulton, {C. C.} and G. Lucovsky and Nemanich, {R. J.} and Yang, {W. C.}",

year = "2006",

month = may,

day = "15",

doi = "10.1063/1.2201707",

language = "English (US)",

volume = "99",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

number = "10",

}

TY - JOUR

T1 - Erratum

T2 - Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

AU - Zeman, M. C.

AU - Fulton, C. C.

AU - Lucovsky, G.

AU - Nemanich, R. J.

AU - Yang, W. C.

PY - 2006/5/15

Y1 - 2006/5/15

UR - http://www.scopus.com/inward/record.url?scp=33744811191&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33744811191&partnerID=8YFLogxK

U2 - 10.1063/1.2201707

DO - 10.1063/1.2201707

M3 - Comment/debate

SN - 0021-8979

VL - 99

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10

M1 - 109902

ER -

Erratum: Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

ASJC Scopus subject areas

Access to Document

Other files and links

Cite this

Erratum: Publisher's Note: Thermal stability of TiO ₂, ZrO ₂, or HfO ₂ on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))