Fiber-coupled 3-DOF interferometer for euv lithography stage metrology

Jonathan D. Ellis; Steven Gillmer; Chen Wang; Richard Smith; Shane C. Woody; Joshua Tarbutton

Fiber-coupled 3-DOF interferometer for euv lithography stage metrology

Jonathan D. Ellis, Steven Gillmer, Chen Wang, Richard Smith, Shane C. Woody, Joshua Tarbutton

Optical Sciences, College of

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	Proceedings - ASPE 2012 Summer Topical Meeting
Subtitle of host publication	Precision Engineering and Mechatronics Supporting the Semiconductor Industry
Pages	36-41
Number of pages	6
State	Published - 2012
Event	ASPE 2012 Summer Topical Meeting on Precision Engineering and Mechatronics Suporting the Semiconductor Industry - Berkeley, CA, United States Duration: Jun 24 2012 → Jun 26 2012

Publication series

Name	Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry
Volume	53

Conference

Conference	ASPE 2012 Summer Topical Meeting on Precision Engineering and Mechatronics Suporting the Semiconductor Industry
Country/Territory	United States
City	Berkeley, CA
Period	6/24/12 → 6/26/12

ASJC Scopus subject areas

Engineering (miscellaneous)

Cite this

Ellis, J. D., Gillmer, S., Wang, C., Smith, R., Woody, S. C., & Tarbutton, J. (2012). Fiber-coupled 3-DOF interferometer for euv lithography stage metrology. In Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry (pp. 36-41). (Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry; Vol. 53).

Fiber-coupled 3-DOF interferometer for euv lithography stage metrology. / Ellis, Jonathan D.; Gillmer, Steven; Wang, Chen et al.
Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry. 2012. p. 36-41 (Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry; Vol. 53).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Ellis, JD, Gillmer, S, Wang, C, Smith, R, Woody, SC & Tarbutton, J 2012, Fiber-coupled 3-DOF interferometer for euv lithography stage metrology. in Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry. Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry, vol. 53, pp. 36-41, ASPE 2012 Summer Topical Meeting on Precision Engineering and Mechatronics Suporting the Semiconductor Industry, Berkeley, CA, United States, 6/24/12.

Ellis JD, Gillmer S, Wang C, Smith R, Woody SC, Tarbutton J. Fiber-coupled 3-DOF interferometer for euv lithography stage metrology. In Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry. 2012. p. 36-41. (Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry).

Ellis, Jonathan D. ; Gillmer, Steven ; Wang, Chen et al. / Fiber-coupled 3-DOF interferometer for euv lithography stage metrology. Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry. 2012. pp. 36-41 (Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry).

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BT - Proceedings - ASPE 2012 Summer Topical Meeting

T2 - ASPE 2012 Summer Topical Meeting on Precision Engineering and Mechatronics Suporting the Semiconductor Industry

Y2 - 24 June 2012 through 26 June 2012

ER -

Fiber-coupled 3-DOF interferometer for euv lithography stage metrology

Publication series

Conference

ASJC Scopus subject areas

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Cite this