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Generation and recombination carrier lifetimes in 4H SiC epitaxial wafers

  • G. Chung
  • , M. J. Loboda
  • , M. J. Marinella
  • , D. K. Schroder
  • , P. B. Klein
  • , T. Isaacs-Smith
  • , J. W. Williams

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Compared to silicon, there have been relatively few comparative studies of recombination and carrier lifetimes in SiC. For the first time, both generation and recombination carrier lifetimes are reported from the same areas in 20 μm thick 4H SiC n-/n+ epi-wafer structures. The ratio of the generation to recombination lifetime is much different in SiC compared to Si. Activation energy calculated from SiC generation lifetimes shows that traps with energy levels near mid-gap dominate the generation lifetime. Comparison of both generation and recombination lifetimes and dislocation counts measured in the device area show no correlation in either case.

Original languageEnglish (US)
Title of host publicationSilicon Carbide and Related Materials 2007
EditorsAkira Suzuki, Hajime Okumura, Kenji Fukuda, Shin-ichi Nishizawa, Tsunenobu Kimoto, Takashi Fuyuki
PublisherTrans Tech Publications Ltd
Pages485-488
Number of pages4
ISBN (Print)9780878493579
DOIs
StatePublished - 2009
Event12th International Conference on Silicon Carbide and Related Materials, ICSCRM 2007 - Otsu, Japan
Duration: Oct 14 2007 → Oct 19 2007

Publication series

NameMaterials Science Forum
Volume600-603

Conference

Conference12th International Conference on Silicon Carbide and Related Materials, ICSCRM 2007
Country/TerritoryJapan
CityOtsu
Period10/14/07 → 10/19/07

Keywords

  • 4H-SiC
  • Generation and recombination lifetimes
  • Oxide leakage currents

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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