Abstract
A mature and well-established SOI CMOS process has been used to fabricate metal-semiconductor field-effect transistors (MESFETs) that operate in the gigahertz range. These 0.6μm depletion-mode SOI MESFETs exhibit a maximum breakdown voltage of 45V in spite of being fabricated using the standard 3.3V CMOS process. This high voltage capability makes the device a strong contender for applications such as power amplifiers, voltage controlled oscillators and DC-DC converters. DC and RF characterization involving breakdown voltage measurements, S-parameter measurements and small-signal parameter extraction was conducted on the device. We have customized an advanced, commercially available TOM3 SPICE MESFET model to represent the SOI MESFET. Based on extracted small-signal parameters, a simplified method to extract the charge parameters of the TOM3 capacitance model was developed. A diode subcircuit has been proposed to model the breakdown mechanism in the SOI MESFET.
Original language | English (US) |
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Title of host publication | IEEE MTT-S International Microwave Symposium Digest |
Pages | 1335-1338 |
Number of pages | 4 |
DOIs | |
State | Published - 2006 |
Event | 2006 IEEE MTT-S International Microwave Symposium Digest - San Francisco, CA, United States Duration: Jun 11 2006 → Jun 16 2006 |
Other
Other | 2006 IEEE MTT-S International Microwave Symposium Digest |
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Country/Territory | United States |
City | San Francisco, CA |
Period | 6/11/06 → 6/16/06 |
Keywords
- Electric breakdown
- MESFETs
- SPICE
- Silicon on insulator technology
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering