TY - JOUR
T1 - Morphology of Au/GaAs interfaces
AU - Liliental-Weber, Z.
AU - Washburn, J.
AU - Newman, N.
AU - Spicer, W. E.
AU - Weber, E. R.
N1 - Copyright: Copyright 2007 Elsevier B.V., All rights reserved.
PY - 1986
Y1 - 1986
N2 - The interface morphology of gold contacts on ultrahigh vacuum (UHV) cleaved, air-exposed, and chemically prepared GaAs surfaces has been studied by electron microscopy. Diodes formed on atomically clean cleaved (110) GaAs surfaces, subsequently annealed at 405°C, were found to have flat interfaces. In contrast, diodes formed on air-exposed and chemically prepared GaAs surfaces, also subsequently annealed at 405°C, were found to have rough and uneven interfaces with a large number of protrusions extending into the semiconductor. They have different orientation relationships with the GaAs substrate than the diodes prepared in situ in UHV. The results of this study show that, upon annealing, the interfacial chemistry and morphology depend strongly on the surface preparation of GaAs before gold deposition.
AB - The interface morphology of gold contacts on ultrahigh vacuum (UHV) cleaved, air-exposed, and chemically prepared GaAs surfaces has been studied by electron microscopy. Diodes formed on atomically clean cleaved (110) GaAs surfaces, subsequently annealed at 405°C, were found to have flat interfaces. In contrast, diodes formed on air-exposed and chemically prepared GaAs surfaces, also subsequently annealed at 405°C, were found to have rough and uneven interfaces with a large number of protrusions extending into the semiconductor. They have different orientation relationships with the GaAs substrate than the diodes prepared in situ in UHV. The results of this study show that, upon annealing, the interfacial chemistry and morphology depend strongly on the surface preparation of GaAs before gold deposition.
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U2 - 10.1063/1.97318
DO - 10.1063/1.97318
M3 - Article
SN - 0003-6951
VL - 49
SP - 1514
EP - 1516
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 22
ER -