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Optically pumped deep-ultraviolet AlGaN multi-quantum-well lasers grown by metalorganic chemical vapor deposition

  • Yuh Shiuan Liu
  • , Tsung Ting Kao
  • , Md Mahbub Satter
  • , Zachary Lochner
  • , Xiao Hang Li
  • , Shyh Chiang Shen
  • , P. Douglas Yoder
  • , Theeradetch Detchprohm
  • , Russell D. Dupuis
  • , Yong Wei
  • , Hongen Xie
  • , Alec Fischer
  • , Fernando Ponce

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A 245.3 nm deep ultraviolet optically pumped AlGaN based multiple-quantum-well laser operating at room temperature is described. Epitaxial growth was performed by metalorganic chemical vapor deposition on a c-plane bulk AlN substrate at a growth temperature of ∼ 1130 °C. The wafer was fabricated into cleaved bars with a cavity length of ∼1.45 mm and the lasing threshold was determined to be 297 kW/cm2 under pulsed 193 nm ArF excimer laser excitation. A further ∼20% reduction in threshold pumping power density was observed with six pairs of SiO2/HfO 2 distributed Bragg reflector deposited at the rear side of facets.

Original languageEnglish (US)
Title of host publicationNovel In-Plane Semiconductor Lasers XIII
PublisherSPIE
ISBN (Print)9780819499158
DOIs
StatePublished - 2014
EventNovel In-Plane Semiconductor Lasers XIII - San Francisco, CA, United States
Duration: Feb 3 2014 → Feb 6 2014

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9002

Other

OtherNovel In-Plane Semiconductor Lasers XIII
Country/TerritoryUnited States
CitySan Francisco, CA
Period2/3/14 → 2/6/14

Keywords

  • III-V semiconductors
  • Metalorganic chemical vapor deposition
  • deep ultraviolet
  • lasers
  • optical pumping

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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