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Parallel direct-write nanolithography using arrays of optically trapped microlenses

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We use Bessel beam optical traps to self-position arrays of microsphere objectives near surfaces. Pulsed laser illumination of these objectives is used to perform near-field direct- write subwavelength optical nanopatterning with 100 nm feature sizes.

Original languageEnglish (US)
Title of host publicationConference on Lasers and Electro-Optics, CLEO 2009
StatePublished - 2009
Externally publishedYes
EventConference on Lasers and Electro-Optics, CLEO 2009 - Baltimore, MD, United States
Duration: May 31 2009Jun 5 2009

Publication series

NameOptics InfoBase Conference Papers

Conference

ConferenceConference on Lasers and Electro-Optics, CLEO 2009
Country/TerritoryUnited States
CityBaltimore, MD
Period5/31/096/5/09

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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