Polarization holograms for source-mask optimization

T. D. Milster; H. Noble; E. Ford; W. Dallas; R. A. Chipman; I. Matsubara; Y. Unno; S. McClain; P. Khulbe; W. S.T. Lam; D. Hansen

doi:10.1117/12.879534

Polarization holograms for source-mask optimization

T. D. Milster, H. Noble, E. Ford, W. Dallas, R. A. Chipman, I. Matsubara, Y. Unno, S. McClain, P. Khulbe, W. S.T. Lam, D. Hansen

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

4 Scopus citations

Abstract

A new technique is introduced to replace DOEs that are used for illumination in lithographic projectors with polarization computer generated holograms (PCGHs) that produce both arbitrary intensity and arbitrary polarization state in the illumination pupil. The additional capability of arbitrary polarization state adds an additional degree of freedom for source-mask optimization. The PCGHs are similar in design and construction to DOEs, but they incorporate polarizationsensitive elements. Three experiments are described that demonstrate different configurations of PCGHs deigned to produce a tangentially polarized ring. Measurements of ratio of polarization and polarization orientation indicate that all three configurations performed well. Experimetns are performed with visible (λ = 632.8nm) light.

Original language	English (US)
Title of host publication	Optical Microlithography XXIV
DOIs	https://doi.org/10.1117/12.879534
State	Published - 2011
Event	Optical Microlithography XXIV - San Jose, CA, United States Duration: Mar 1 2011 → Mar 3 2011

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7973

Other

Other	Optical Microlithography XXIV
Country/Territory	United States
City	San Jose, CA
Period	3/1/11 → 3/3/11

Keywords

Computer generated hologram
Diffractive optical element
Illumination
Lithography
Polarization
Projection camera
Source-mask optimization

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.879534

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Milster, T. D., Noble, H., Ford, E., Dallas, W., Chipman, R. A., Matsubara, I., Unno, Y., McClain, S., Khulbe, P., Lam, W. S. T., & Hansen, D. (2011). Polarization holograms for source-mask optimization. In Optical Microlithography XXIV Article 79731A (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7973). https://doi.org/10.1117/12.879534

Milster, TD, Noble, H, Ford, E, Dallas, W, Chipman, RA, Matsubara, I, Unno, Y, McClain, S, Khulbe, P, Lam, WST & Hansen, D 2011, Polarization holograms for source-mask optimization. in Optical Microlithography XXIV., 79731A, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7973, Optical Microlithography XXIV, San Jose, CA, United States, 3/1/11. https://doi.org/10.1117/12.879534

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title = "Polarization holograms for source-mask optimization",

abstract = "A new technique is introduced to replace DOEs that are used for illumination in lithographic projectors with polarization computer generated holograms (PCGHs) that produce both arbitrary intensity and arbitrary polarization state in the illumination pupil. The additional capability of arbitrary polarization state adds an additional degree of freedom for source-mask optimization. The PCGHs are similar in design and construction to DOEs, but they incorporate polarizationsensitive elements. Three experiments are described that demonstrate different configurations of PCGHs deigned to produce a tangentially polarized ring. Measurements of ratio of polarization and polarization orientation indicate that all three configurations performed well. Experimetns are performed with visible (λ = 632.8nm) light.",

keywords = "Computer generated hologram, Diffractive optical element, Illumination, Lithography, Polarization, Projection camera, Source-mask optimization",

author = "Milster, {T. D.} and H. Noble and E. Ford and W. Dallas and Chipman, {R. A.} and I. Matsubara and Y. Unno and S. McClain and P. Khulbe and Lam, {W. S.T.} and D. Hansen",

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doi = "10.1117/12.879534",

language = "English (US)",

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series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Optical Microlithography XXIV",

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AU - Milster, T. D.

AU - Noble, H.

AU - Ford, E.

AU - Dallas, W.

AU - Chipman, R. A.

AU - Matsubara, I.

AU - Unno, Y.

AU - McClain, S.

AU - Khulbe, P.

AU - Lam, W. S.T.

AU - Hansen, D.

PY - 2011

Y1 - 2011

N2 - A new technique is introduced to replace DOEs that are used for illumination in lithographic projectors with polarization computer generated holograms (PCGHs) that produce both arbitrary intensity and arbitrary polarization state in the illumination pupil. The additional capability of arbitrary polarization state adds an additional degree of freedom for source-mask optimization. The PCGHs are similar in design and construction to DOEs, but they incorporate polarizationsensitive elements. Three experiments are described that demonstrate different configurations of PCGHs deigned to produce a tangentially polarized ring. Measurements of ratio of polarization and polarization orientation indicate that all three configurations performed well. Experimetns are performed with visible (λ = 632.8nm) light.

AB - A new technique is introduced to replace DOEs that are used for illumination in lithographic projectors with polarization computer generated holograms (PCGHs) that produce both arbitrary intensity and arbitrary polarization state in the illumination pupil. The additional capability of arbitrary polarization state adds an additional degree of freedom for source-mask optimization. The PCGHs are similar in design and construction to DOEs, but they incorporate polarizationsensitive elements. Three experiments are described that demonstrate different configurations of PCGHs deigned to produce a tangentially polarized ring. Measurements of ratio of polarization and polarization orientation indicate that all three configurations performed well. Experimetns are performed with visible (λ = 632.8nm) light.

KW - Computer generated hologram

KW - Diffractive optical element

KW - Illumination

KW - Lithography

KW - Polarization

KW - Projection camera

KW - Source-mask optimization

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T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Optical Microlithography XXIV

T2 - Optical Microlithography XXIV

Y2 - 1 March 2011 through 3 March 2011

ER -

Polarization holograms for source-mask optimization

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Keywords

ASJC Scopus subject areas

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