Reversible stress changes at all stages of Volmer-Weber film growth

C. Friesen, S. C. Seel, C. V. Thompson

Research output: Contribution to journalArticlepeer-review

110 Scopus citations


Reversible stress changes observed during interruptions of Volume-Weber growth of thin films are phenomenologically similar in the pre-coalescence and post-coalescence growth regimes. The stress reversibly relaxes in the tensile direction in both regimes, and the magnitude of the reversible stress change increases with increasing pre-interruption deposition rates in both regimes. In addition, the initial rate of stress change during a growth interruption is slower than the initial rate stress change when growth is resumed. This paper demonstrates that high-sensitivity stress measurement with high temporal resolution provides a powerful tool for probing dynamic atomic processes during film growth.

Original languageEnglish (US)
Pages (from-to)1011-1020
Number of pages10
JournalJournal of Applied Physics
Issue number3
StatePublished - Feb 1 2004
Externally publishedYes

ASJC Scopus subject areas

  • General Physics and Astronomy


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