Skip to main navigation Skip to search Skip to main content

TID Effects on Random Telegraph Signals in Bulk 90 nm MOSFET Devices

  • Jereme Neuendank
  • , Fahad Al Mamun
  • , Hugh Barnaby
  • , Stefano Bonaldo
  • , Matthew Spear
  • , Trace Wallace
  • , Daniel Loveless
  • , Jacob Pew
  • , Mohamed Nour
  • , Pete Manos
  • , Zach Giorno
  • , Usman Suriono
  • , Mike Chambers
  • , Steve Kosier

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

90-nm MOSFETs from SkyWater are tested under X-ray. Low frequency noise measurements evidence random telegraph noise at various gate voltages in both pre-and post-rad conditions, revealing pre-existing and TID-induced prominent defects.

Original languageEnglish (US)
Title of host publication2023 IEEE International Integrated Reliability Workshop, IIRW 2023
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350327274
DOIs
StatePublished - 2023
Event2023 IEEE International Integrated Reliability Workshop, IIRW 2023 - South Lake Tahoe, United States
Duration: Oct 8 2023 → Oct 12 2023

Publication series

NameIEEE International Integrated Reliability Workshop Final Report

Conference

Conference2023 IEEE International Integrated Reliability Workshop, IIRW 2023
Country/TerritoryUnited States
CitySouth Lake Tahoe
Period10/8/23 → 10/12/23

Keywords

  • RTN
  • RTS
  • Random Telegraph Noise
  • Random Telegraph Signal
  • TID
  • Total Ionizing Dose

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Safety, Risk, Reliability and Quality
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'TID Effects on Random Telegraph Signals in Bulk 90 nm MOSFET Devices'. Together they form a unique fingerprint.

Cite this