@inproceedings{aa32f5177bba4fe889659fa143f29fef,
title = "Wettability and cleaning of silicon wafers in tetramethyl ammonium hydroxide-based solutions",
abstract = "The effectiveness of commercially available tetramethyl ammonium hydroxide (TMAH)-based solutions (PFC-1 and ANC-1) in modulating the wettability of silicon was investigated. The results showed that hydrophobic silicon wafers can be made wettable by immersion/emersion cycling in TMAH solutions or through the addition of hydrogen peroxide or surfactant to the solutions. The etch rate of silicon wafer in the various TMAH-containing solutions was also investigated. Particle removal, investigated as a function of solution pH and initial particle count on wafers, showed that there is an optimum particle count on the wafers above which particle removal with PFC-1 solution is feasible.",
author = "Jeon, {J. S.} and S. Raghavan",
year = "1993",
language = "English (US)",
isbn = "1877862193",
series = "Proceedings, Annual Technical Meeting - Institute of Environmental Sciences",
publisher = "Publ by Inst of Environmental Sciences",
pages = "268--273",
editor = "Anon",
booktitle = "Proceedings, Annual Technical Meeting - Institute of Environmental Sciences",
note = "Proceedings of the 39th Annual Technical Meeting of Institute of Environmental Sciences ; Conference date: 02-05-1993 Through 07-05-1993",
}